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dc.contributor.authorWenas, Donny R.-
dc.contributor.authorHerman-
dc.contributor.authorSiregar, R. E.-
dc.contributor.authorTjiaa, M. O.-
dc.date.accessioned2020-03-18T12:32:08Z-
dc.date.available2020-03-18T12:32:08Z-
dc.date.issued2010-
dc.identifier.urihttp://localhost:8080/xmlui/handle/123456789/463-
dc.description.abstractDisperse Red-1 (DR1) films have been prepared by Electric field-assisted Physical Vapor Deposition (E-PVD) method at various external electric field strengths on the ITO substrate. The resulted films were characterized by X-ray diffraction spectroscopy and the optical properties are investigated by Reflectometric and ATR measurements. The XRD data show growing diffraction peaks with increasing electric field corresponding to increasing number of molecules deposited with the head-to-tail stacking along the molecular chain. Further, the reflectometer data show a rising trend of the optical refractive index of the films produced with increasing electric field. This result is consistent with the frequency shift of SPR (Surface Plasmon Resonance) measured by ATR method.en_US
dc.language.isoenen_US
dc.relation.ispartofseriesX-Ray Diffraction Pattern and Optical Properties Of Disperse Red-1 Thin Films Deposited By Electric Field Assisted PVD Method;-
dc.subjectDisperse Red-1, E-PVD, electric poling field, SPRen_US
dc.titleX-Ray Diffraction Pattern and Optical Properties Of Disperse Red-1 Thin Films Deposited By Electric Field Assisted PVD Methoden_US
dc.typeArticleen_US
Appears in Collections:Lecturer Scientific Papers



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