Please use this identifier to cite or link to this item: http://localhost:8080/xmlui/handle/123456789/460
Title: Effect of substrate surface on DR-19 films deposition process with using EFA-PVD method
Authors: Wenas, Donny R.
Bujung, Cyrke A.N.
Issue Date: 2019
Series/Report no.: ICOMSET2018;IOP Conf. Series: Journal of Physics: Conf. Series 1317 (2019) 012059
Abstract: The Disperse Red 19 (DR-19) with its conjugated chain structure is known to offer great potential for photonic device applications, such as optical switching and optical data storage. This researches aim to study surfactant effect of silane substrate and the effect of external electric field applied during the deposition process on properties of the resulted DR-19 film. This researches using Electric Field Assisted Physical Vapor Deposition (EFA-PVD) method. The characterization of the film structure was performed by means of XRD. The deposited molecular orientation was characterized with UV-Vis spectroscopic measurement. Based on these spectroscopic data, it is shown that anchoring mechanism with hydrogen bonding does occurred between DR-19 molecule and silane substrate responsible of the stability of the fabricated film. Result of this research show that DR-19 films have been obtained which exhibit crystalline structure with the molecules deposited in parallel polar orientation perpendicular to the silane substrate surface and regular head to tail stacking when increasing external electric field. This is understood to be result of the formation of strong hydrogen bonding acting as the anchoring mechanism.
URI: http://localhost:8080/xmlui/handle/123456789/460
Appears in Collections:Lecturer Scientific Papers

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